Fabrication of micro/nanodevices using a sequence of steps which include the deposition and standardisation of successive layers of semiconductors, metals and oxides; fabrication of thin films using physical deposition methods.
At the Optoelectronics and Electronic Systems Unit (UOSE) we are experienced in fabricating micro/nanodevices using a sequence of steps which include the deposition and standardisation of successive layers of semiconductors, metals and oxides, which are at the centre of the most recent advances in several modern scientific and technological areas.
Our activities also focus on the fabrication of thins films using physical deposition methods and on mechanisms based on these films. To perform these activities, at UOSE we have a state-of-the-art lab which includes a clean room facility with different types of technologies: evaporators (thermal and electron beam systems), sputtering, Reactive ion-etching (RIE), Plasma Enhanced Chemical Vapour Deposition (PECVD) and lithography (spinner, mask aligner, etc). Furthermore, we have at our disposal an ultra-high vacuum chamber and an excimer laser (KrF) for pulsed laser deposition (PLD), silicon cutting, polishing and curing machines, as well as micromachinery.
- University of Glasgow (United Kingdom)
- Universidade do Porto (Portugal)
- Universidade de Aveiro (Portugal)
- Université Paris Sud (France)
- Université des Sciences et Technologies de Lille (France)
- Universitaet Hamburg (Germany)
- École Polytechnique Fédérale de Lausanne (Switzerland)